Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases.

The EasyTube® 6000 series multi-tube horizontal furnace systems are automatically controlled research units for batch processing of up to 50 wafers per run per tube (process dependent), in up to four separately configured process tubes.

The EasyTube® 6000 series multi-tube horizontal furnace systems are automatically controlled research units for batch processing of up to 50 wafers per run per tube (process dependent), in up to four separately configured process tubes.

This 1400°C Horizontal Tube Furnace is widely used in CVD experiment whose reaction temperature is around 1400 degree Celsius. It can also used in vacuum sintering, sintering under vacuum atmosphere protection , nano material preparation, …

Digiqual Systems offering Vacuum CVD Tubular Furnace & Horizontal Tubular Furnaces which are used to conduct syntheses and purification of inorganic compounds.

The EasyTube® 6000 series multi-tube horizontal furnace systems are automatically controlled research units for batch processing of up to 100 wafers per run per tube, with up to four separately configured process tubes. EasyTube® CVD systems can be configured for a wide range of substrate sizes and process requirements.

Graphite resistance heated hot zones withstand harsh CVD environments. Induction heating available for Carbon CVI applications or ultra-high temperatures. Vertical top and bottom loading furnaces available as well as horizontal rectangular configurations depending on workpiece size, shape, and quantity.

The CVD system consists of a gas supply system + a tube furnace + a gas extraction system. The maximum temperature can reach 1200 degrees, 1400 degrees, 1600 degrees, and 1700 degrees. The heating zone can be single temperature zone, dual temperature zone, three temperature zone, etc., and the ultimate vacuum It can reach 10-3Pa.

This high temperature 1500.C Horizontal Tube Furnace is widely used in CVD experiment whose reacion temperature is around 1400 degree celsius. It can also used in vacuum sintering, sintering under vacuum atmosphere protection, nano material preparation, battery material preparation and other research field.

Plasmionique’s horizontal CVD furnaces have the option to operate with single or multiple heating zones. Combined with our patented flow management systems, our Thermal Evaporation Tube Furnaces offer unparalleled flexibility. These systems consist of a quartz tube with an outer diameter of around 100 mm or larger, serving as the vacuum chamber.