is a reactive ion etcher with the addition of a inductively coupled plasma to achieve a high density plasma for enhanced anisotropic etching. This system is limited to non-metal samples and currently ...

To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...

These processes are commonly used in semiconductor wafer processing, for microfabrication processes and in other ... Micro-electronic circuit wafers are typically manufactured using plasma etch ...