PVD: Involves the physical transition of a material from a condensed phase to a vapor phase by sputtering or evaporation in a vacuum environment, followed by deposition on the substrate. The process ...

Chemical vapor deposition (CVD) is a process widely used in the manufacturing of electronic and energy devices as it is able to form conducting, semiconducting and dielectric thin films. Here, in the ...

In a recent study published in Nature Communications, researchers added a heavy inert gas co-flow to improve step coverage (SC) in the chemical vapor deposition (CVD) process. This approach was ...

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...

Lastly, a simplified chemical vapor deposition (CVD) method was developed to create near-zero thickness SiNx films. This process combined controlled precursor pulses with continuous ammonia plasma ...

The FirstNano EasyTube 101 CVD system is used for the growth of carbon nanotubes (CNTs). The system can grow areas up to 25 mm × 75 mm using an iron catalyst deposited by the Fredrick electron beam ...